-
1
-
-
0035819003
-
Light work with water
-
N. S. Lewis, “Light work with water, ” Nature 414(6864), 589-590 (2001).
-
(2001)
Nature
, vol.414
, Issue.6864
, pp. 589-590
-
-
Lewis, N.S.1
-
2
-
-
35348875044
-
Electrochemical photolysis of water at a semiconductor electrode
-
A. Fujishima and K. Honda, “Electrochemical photolysis of water at a semiconductor electrode, ” Nature 238(5358), 37-38 (1972).
-
(1972)
Nature
, vol.238
, Issue.5358
, pp. 37-38
-
-
Fujishima, A.1
Honda, K.2
-
3
-
-
0042366841
-
Electrode materials for photoelectrochemical devices
-
A. J. Nozik, “Electrode materials for photoelectrochemical devices, ” J. Cryst. Growth 39(1), 200-209 (1977).
-
(1977)
J. Cryst. Growth
, vol.39
, Issue.1
, pp. 200-209
-
-
Nozik, A.J.1
-
4
-
-
0023324726
-
Significant efficiency increase in self-driven photoelectrochemical cell for water photoelectrolysis
-
R. C. Kainthla and B. Zelenay, “Significant efficiency increase in self-driven photoelectrochemical cell for water photoelectrolysis, ” J. Electrochem. Soc. 134(4), 841 (1987).
-
(1987)
J. Electrochem. Soc.
, vol.134
, Issue.4
, pp. 841
-
-
Kainthla, R.C.1
Zelenay, B.2
-
5
-
-
0030218236
-
Physical chemistry of semiconductor-liquid interfaces
-
A. J. Nozik and R. Memming, “Physical chemistry of semiconductor-liquid interfaces, ” J. Phys. Chem. 100(31), 13061-13078 (1996).
-
(1996)
J. Phys. Chem.
, vol.100
, Issue.31
, pp. 13061-13078
-
-
Nozik, A.J.1
Memming, R.2
-
6
-
-
34548426061
-
Direct water photoelectrolysis with patterned n-GaN
-
I. Waki, D. Cohen, R. Lal, U. Mishra, S. P. DenBaars, and S. Nakamura, “Direct water photoelectrolysis with patterned n-GaN, ” Appl. Phys. Lett. 91(9), 093519 (2007).
-
(2007)
Appl. Phys. Lett
, vol.91
, Issue.9
, pp. 93519
-
-
Waki, I.1
Cohen, D.2
Lal, R.3
Mishra, U.4
Denbaars, S.P.5
Nakamura, S.6
-
7
-
-
79956041003
-
Small band gap bowing in In GaN alloys
-
J. Wu, W. Walukiewicz, K. M. Yu, J. W. Ager III, E. E. Haller, H. Lu, and W. J. Schaff, “Small band gap bowing in In GaN alloys, ” Appl. Phys. Lett. 80(25), 4741 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, Issue.25
, pp. 4741
-
-
Wu, J.1
Walukiewicz, W.2
Yu, K.M.3
Ager, J.W.4
Haller, E.E.5
Lu, H.6
Schaff, W.J.7
-
8
-
-
30344477894
-
Hydrogen gas generation by splitting aqueous water using n-type GaN photoelectrode with anodic oxidation
-
K. Fujii, T. Karasawa, and K. Ohkawa, “Hydrogen gas generation by splitting aqueous water using n-type GaN photoelectrode with anodic oxidation, ” Jpn. J. Appl. Phys. 44(18), 543-545 (2005).
-
(2005)
Jpn. J. Appl. Phys.
, vol.44
, Issue.18
, pp. 543-545
-
-
Fujii, K.1
Karasawa, T.2
Ohkawa, K.3
-
9
-
-
54949143962
-
Direct hydrogen gas generation by using InGaN epilayers as working electrodes
-
J. Li, J. Y. Lin, and H. X. Jiang, “Direct hydrogen gas generation by using InGaN epilayers as working electrodes, ” Appl. Phys. Lett. 93(16), 162107 (2008).
-
(2008)
Appl. Phys. Lett
, vol.93
, Issue.16
, pp. 162107
-
-
Li, J.1
Lin, J.Y.2
Jiang, H.X.3
-
10
-
-
33846964940
-
Photoelectrochemical reaction and H2 generation at zero bias optimized by carrier concentration of n-type GaN
-
2generation at zero bias optimized by carrier concentration of n-type GaN, ” J. Chem. Phys. 126(5), 054708 (2007).
-
(2007)
J. Chem. Phys
, vol.126
, Issue.5
, pp. 54708
-
-
Ono, M.1
Fujii, K.2
Ito, T.3
Iwaki, Y.4
Hirako, A.5
Yao, T.6
Ohkawa, K.7
-
11
-
-
73849099373
-
Improved hydrogen gas generation rate of n-GaN photoelectrode with SiO2 Protection layer on the ohmic contacts from the electrolyte
-
2 Protection layer on the ohmic contacts from the electrolyte, ” J. Electrochem. Soc. 157(2), B266-B268 (2010).
-
(2010)
J. Electrochem. Soc.
, vol.157
, Issue.2
, pp. B266-B268
-
-
Liu, S.Y.1
Sheu, J.K.2
Tseng, C.K.3
Ye, J.C.4
Chang, K.H.5
Lee, M.L.6
Lai, W.C.7
-
12
-
-
0033225346
-
Indium tin oxide ohmic contact to highly doped n-GaN
-
J. K. Sheu, Y. K. Su, G. C. Chi, M. J. Jou, C. M. Chang, and C. C. Liu, “Indium tin oxide ohmic contact to highly doped n-GaN, ” Solid-State Electron. 43(11), 2081-2084 (1999).
-
(1999)
Solid-State Electron
, vol.43
, Issue.11
, pp. 2081-2084
-
-
Sheu, J.K.1
Su, Y.K.2
Chi, G.C.3
Jou, M.J.4
Chang, C.M.5
Liu, C.C.6
-
13
-
-
0032620316
-
Indium tin oxide contacts to gallium nitride optoelectronic devices
-
T. Margalith, O. Buchinsky, D. A. Cohen, A. C. Abare, M. Hansen, S. P. DenBaars, and L. A. Coldren, “Indium tin oxide contacts to gallium nitride optoelectronic devices, ” Appl. Phys. Lett. 74(26), 3930 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.74
, Issue.26
, pp. 3930
-
-
Margalith, T.1
Buchinsky, O.2
Cohen, D.A.3
Abare, A.C.4
Hansen, M.5
Denbaars, S.P.6
Coldren, L.A.7
-
14
-
-
25844517173
-
Comparison of the Electrical, Optical, and Electrochemical Properties of Diamond and Indium Tin Oxide Thin-Film Electrodes
-
J. Stotter, Y. Show, S. Wang, and G. Swain, “Comparison of the Electrical, Optical, and Electrochemical Properties of Diamond and Indium Tin Oxide Thin-Film Electrodes, ” Chem. Mater. 17(19), 4880-4888 (2005).
-
(2005)
Chem. Mater.
, vol.17
, Issue.19
, pp. 4880-4888
-
-
Stotter, J.1
Show, Y.2
Wang, S.3
Swain, G.4
-
15
-
-
77951214462
-
Improvement of hydrogen generation efficiency using GaN photoelectrochemical reaction in electrolytes with alcohol
-
K. Fujii, H. Nakayama, K. Sato, T. Kato, M. W. Cho, and T. Yao, “Improvement of hydrogen generation efficiency using GaN photoelectrochemical reaction in electrolytes with alcohol, ” Phys. Stat. Solidi C 5(6), 2333-2335 (2008).
-
(2008)
Phys. Stat. Solidi C
, vol.5
, Issue.6
, pp. 2333-2335
-
-
Fujii, K.1
Nakayama, H.2
Sato, K.3
Kato, T.4
Cho, M.W.5
Yao, T.6
-
16
-
-
0038317435
-
(Photo)electrochemical characterization of tin-doped indium oxide
-
J. E. A. M. van den Meerakker, E. A. Meulenkamp, and M. Scholten, “(Photo)electrochemical characterization of tin-doped indium oxide, ” J. Appl. Phys. 74(5), 3282 (1993).
-
(1993)
J. Appl. Phys.
, vol.74
, Issue.5
, pp. 3282
-
-
Van Den Meerakker, J.E.A.M.1
Meulenkamp, E.A.2
Scholten, M.3
-
18
-
-
0141793058
-
The electrochemical behavior of tin-doped indium oxide during reduction in 0.3 M hydrochloric acid
-
C. A. Huang, K. C. Li, G. C. Tu, and W. S. Wang, “The electrochemical behavior of tin-doped indium oxide during reduction in 0.3 M hydrochloric acid, ” Electrochim. Acta 48(24), 3599-3605 (2003).
-
(2003)
Electrochim. Acta
, vol.48
, Issue.24
, pp. 3599-3605
-
-
Huang, C.A.1
Li, K.C.2
Tu, G.C.3
Wang, W.S.4
|