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Volumn 520, Issue 2, 2011, Pages 871-875

An X-ray photoelectron spectroscopy study of ultra-thin oxynitride films

Author keywords

Plasma nitridation; Silicon oxynitrides; Thickness measurement; Thin films; XPS

Indexed keywords

EXIT ANGLES; INELASTIC MEAN FREE PATH; ITERATIVE PROCEDURES; MATRIX; NITRIDED LAYER; NITROGEN CONTENT; NITROGEN INCORPORATION; OXYNITRIDE FILMS; OXYNITRIDES; PLASMA NITRIDATION; RELATIVE SENSITIVITY FACTOR; SILICON OXYNITRIDES; ULTRA-THIN; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

EID: 80755132250     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.161     Document Type: Conference Paper
Times cited : (16)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.