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Volumn 8168, Issue , 2011, Pages
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Laser induced damage of pure and mixture material high reflectors for 355nm and 1064nm wavelength
a a a b c a,d |
Author keywords
1064nm; 355nm; Hafnia mixtures; High reflecting multilayers; Laser induced damage
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Indexed keywords
1064NM;
355NM;
HAFNIA MIXTURES;
HIGH REFLECTING MULTILAYERS;
LASER-INDUCED DAMAGE;
ATOMIC SPECTROSCOPY;
COATINGS;
ELECTRON BEAMS;
EVAPORATION;
FILM PREPARATION;
HAFNIUM OXIDES;
HIGH POWER LASERS;
LASER DAMAGE;
MATERIALS HANDLING;
MIXTURES;
MULTILAYER FILMS;
MULTILAYERS;
NEODYMIUM LASERS;
OPTICAL CONSTANTS;
PHASE TRANSITIONS;
PHOTOELECTRON SPECTROSCOPY;
REFLECTION;
REFRACTIVE INDEX;
SILICON COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
VAPOR DEPOSITION;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAY SPECTROSCOPY;
PULSED LASERS;
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EID: 80455174267
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.897049 Document Type: Conference Paper |
Times cited : (39)
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References (13)
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