Ion source characterization based on an array of retarding field analyzers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5963, Issue , 2005, Pages

  Beermann, N ^a   Ehlers, H ^a   Ristau, D ^a  

^a LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

Faraday cup; Ion assisted deposition; Ion emission profile; Multicup array; Retarding field analyzer

Indexed keywords

ARRAYS; CURRENT DENSITY; GEOMETRICAL OPTICS; OPTICAL COATINGS;

FARADAY CUP; ION ASSISTED DEPOSITION; ION EMISSION PROFILE; MULTICUP ARRAY; RETARDING FIELD ANALYZER;

ION SOURCES;

EID: 33144468374     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.625215     Document Type: Conference Paper

References (2)

1. W. Ensinger, Ion Sources for Ion Beam Assisted Thin-Film Deposition, Rev. Sci. Instrum., 63 (11), pp. 5217-5233 (1992)
2. Y. Okuno et al, Two-dimensional ion velocity distribution functions in electron cyclotron resonance plasa under a divergent magnetic field, J. Appl. Phys., 74 (10), pp. 5990-5996 (1993)