Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7842, Issue , 2010, Pages

  Jensen, Lars O ^a   Mende, Mathias ^a   Blaschke, Holger ^a   Ristau, Detlev ^a   Nguyen, Duy ^b   Emmert, Luke ^b   Rudolph, Wolfgang ^b  

^a LASER ZENTRUM HANNOVER E V   (Germany)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

LIDT; Oxide Mixtures; SiO2 HfO2

Indexed keywords

COATING DESIGNS; DAMAGE MECHANISM; DAMAGE TESTING; DAMAGE THRESHOLD; FEMTOSECOND PULSE; FEMTOSECONDS; FS PULSE; HIGH REFLECTOR; LASER-INDUCED DAMAGE; LIDT; MIXING RATIOS; MIXTURE RATIO; NANOSECOND PULSE; OXIDE MIXTURES; SINGLE LAYER; SIO2/HFO2;

COATINGS; ELECTROMAGNETIC PULSE; HAFNIUM OXIDES; LASER DAMAGE; MIXTURES; OPTICAL MATERIALS; SILICA;

NEODYMIUM LASERS;

EID: 79751516687     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.867238     Document Type: Conference Paper

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