Determination of constitutive and morphological parameters of columnar thin films by inverse homogenization

Journal of Nanophotonics

Volumn 4, Issue 1, 2010, Pages

  MacKay, Tom G ^a,b   Lakhtakia, Akhlesh ^b  

^a UNIVERSITY OF EDINBURGH   (United Kingdom)

^b The Pennsylvania State University   (United States)

Author keywords

Bruggeman homogenization formalism; Newton Raphson technique; tantalum oxide; titanium oxide; zirconium oxide

Indexed keywords

NANOTECHNOLOGY; PERMITTIVITY; REFRACTIVE INDEX; TANTALUM OXIDES; THIN FILMS; TITANIUM OXIDES; ZIRCONIA; ZIRCONIUM COMPOUNDS;

BRUGGEMAN HOMOGENIZATION FORMALISM; COLUMNAR THIN FILMS; DEPOSITED MATERIALS; ELLIPSOIDAL INCLUSIONS; INVERSE HOMOGENIZATION; MORPHOLOGICAL PARAMETERS; NEWTON-RAPHSON TECHNIQUES; RELATIVE PERMITTIVITY;

DIELECTRIC MATERIALS;

EID: 80455150211     PISSN: None     EISSN: 19342608     Source Type: Journal    
DOI: 10.1117/1.3332584     Document Type: Article

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