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Volumn 84, Issue 16, 2011, Pages

Modeling spin transport in electrostatically-gated lateral-channel silicon devices: Role of interfacial spin relaxation

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Indexed keywords


EID: 80455129278     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.84.165318     Document Type: Article
Times cited : (39)

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