Stochastic modeling of photoresist development in two and three dimensions

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 9, Issue 4, 2010, Pages

  Mack, Chris A ^a  

^a NONE   (United States)

Author keywords

Dynamical scaling; Kinetic roughness; Line edge roughness; Linewidth roughness; Photoresist development; Stochastic modeling

Indexed keywords

KINETICS; STOCHASTIC SYSTEMS;

DYNAMICAL SCALING; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; PHOTORESIST DEVELOPMENT; STOCHASTIC MODELING;

PHOTORESISTS;

EID: 80455124080     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3494607     Document Type: Conference Paper

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