Characterization of nanocrystalline nitrogen-containing titanium oxide obtained by N2/O2/Ar low-field helicon plasma sputtering

Journal of Physics D: Applied Physics

Volumn 44, Issue 45, 2011, Pages

  Sarra Bournet, C ^a   Haberl, B ^a   Charles, C ^a   Boswell, R ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; CHEMICAL COMPOSITIONS; CRYSTALLINE STRUCTURE; GROWTH MECHANISMS; HELICON PLASMA; LOW-TEMPERATURE PROCESS; NANOCRYSTALLINES; NITROGEN-DOPING; POLYCRYSTALLINE; REACTIVE PLASMAS; RED SHIFT; RUTILE PHASE; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; SILICON WAFER SUBSTRATES; TIO; VISIBLE SPECTRA;

ABSORPTION SPECTROSCOPY; CRYSTALLINE MATERIALS; FILM GROWTH; HELICONS; NANOCRYSTALLINE SILICON; NITROGEN PLASMA; OXIDE FILMS; OXIDE MINERALS; OXYGEN VACANCIES; PHOTOELECTRON SPECTROSCOPY; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SILICON WAFERS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN;

EID: 80055087619     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/45/455202     Document Type: Article

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