Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for extreme ultraviolet lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Sogard, Michael R ^a   Mikkelson, Andrew R ^b   Ramaswamy, Vasu ^b   Engelstad, Roxann L ^b  

^a Nikon Res Corporation of America   (United States)

^b University of Wisconsin Madison   (United States)

Author keywords

Electrostatic chucking; Extreme ultraviolet lithography; Extreme ultraviolet lithography reticle chucking; Finite element modeling; Particle chucking effects

Indexed keywords

ELECTROSTATICS; EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS;

CRITICAL ISSUES; ELASTIC ANALYSIS; ELECTROSTATIC CHUCKING; ELECTROSTATIC CHUCKS; EXTREME ULTRAVIOLET; FINITE ELEMENT MODELING; SIMULATION RESULT; THICKNESS VARIATION;

CHUCKS;

EID: 80055083267     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3238518     Document Type: Conference Paper

References (11)

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