High-rate low-temperature growth of vertically aligned carbon nanotubes

Nanotechnology

Volumn 21, Issue 50, 2010, Pages

  Shang, N G ^a   Tan, Y Y ^a   Stolojan, V ^a   Papakonstantinou, P ^b   Silva, S R P ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN; BACK END OF LINES; BI-LAYER FILMS; CHEMICAL VAPOUR DEPOSITION; CMOS COMPATIBLE; GRAPHENE SHELLS; HIGH GROWTH RATE; HIGH RATE; INNER DIAMETERS; LOW TEMPERATURE GROWTH; LOW TEMPERATURES; LOW-TEMPERATURE DEPOSITION; OUTER DIAMETERS; PHOTO-THERMAL; RAPID GROWTH; THERMAL CVD; TOP-DOWN HEATING; TRANSMISSION ELECTRON MICROSCOPY OBSERVATION; VERTICALLY ALIGNED CARBON NANOTUBE;

CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; GRAPHENE; TRANSMISSION ELECTRON MICROSCOPY;

FILM GROWTH;

EID: 78650110971     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/50/505604     Document Type: Article

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