Nucleation and growth of Fe nanoparticles in SiO2: A TEM, XPS, and Fe L-Edge XANES investigation

Journal of Physical Chemistry C

Volumn 115, Issue 43, 2011, Pages 20978-20985

  Leveneur, Jérôme ^a,b   Waterhouse, Geoffrey I N ^b,c   Kennedy, John ^a,c   Metson, James B ^b,c   Mitchell, David R G ^d  

^a GNS SCIENCE   (New Zealand)

^b UNIVERSITY OF AUCKLAND   (New Zealand)

^c MACDIARMID INSTITUTE FOR ADVANCED MATERIALS AND NANOTECHNOLOGY   (New Zealand)

^d UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM ANNEALING; FE NANOCLUSTERS; FE OXIDE; FE SPECIES; FLUENCES; FLUXGATES; HARD MAGNETS; IRON NANOPARTICLES; LOW ENERGY ION IMPLANTATION; NEAR SURFACE REGIONS; NUCLEATION AND GROWTH; ON CHIPS; POSTIMPLANTATION ANNEALING; SILICA MATRIX; SILICA THIN FILMS; SILICON SUBSTRATES; SURFACE OXIDE FILMS; X-RAY ABSORPTION NEAR EDGE SPECTROSCOPY; XANES;

ABSORPTION SPECTROSCOPY; ANNEALING; ELECTRON BEAMS; ION IMPLANTATION; IONS; IRON; METALLIC COMPOUNDS; NANOPARTICLES; NUCLEATION; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOMAGNETICS;

EID: 80055037775     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp206357c     Document Type: Article

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