Fabrication of surface magnetic nanoclusters using low energy ion implantation and electron beam annealing

Nanotechnology

Volumn 22, Issue 11, 2011, Pages

  Kennedy, J ^a,b   Leveneur, J ^a   Williams, G V M ^b,c   Mitchell, D R G ^d   Markwitz, A ^a,b  

^a GNS SCIENCE   (New Zealand)

^b MacDiarmid Institute for Advanced Materials and Nanotechnolog   (New Zealand)

^c CALLAGHAN INNOVATION   (New Zealand)

^d UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BIOMEDICAL DEVICES; ELECTRON BEAM ANNEALING; FE ATOMS; FURNACE ANNEALING; HIGH-DENSITY; HIGH-PERFORMANCE PERMANENT MAGNETS; IRON NANOCLUSTERS; LOW DOSE; LOW ENERGY ION IMPLANTATION; MAGNETIC NANOCLUSTERS; MAGNETIC STORAGE MEDIA; MAGNETOMETRY MEASUREMENTS; MICRO-ELECTRONIC DEVICES; NANO SCALE; NOVEL APPLICATIONS; SPINTRONICS; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICE; SUPERPARAMAGNETIC PROPERTY; TRADITIONAL MATERIALS;

ANNEALING; ATOMIC FORCE MICROSCOPY; DESORPTION; ELECTRON BEAMS; FABRICATION; ION IMPLANTATION; MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MAGNETIC SENSORS; MAGNETIC STORAGE; METAL ANALYSIS; MICROELECTRONICS; NANOCLUSTERS; NANOMAGNETICS; SILICON COMPOUNDS; SQUIDS; SUPERPARAMAGNETISM; SURFACES;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 79951828289     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/11/115602     Document Type: Article

References (29)

1. Cowburn R P 2007 Nature 448 544-5
2. Amekura H, Umeda N, Takeda Y and Kishimoto N 2006 Appl. Phys. Lett. 89 223120
3. Lobotka P, Dérer J, Vávra I, de Julián Fernández C, Mattei G and Mazzoldi P 2007 Phys. Rev. B 75 024423
4. Kim J, Rong C, Liu J P and Sun S 2009 Adv. Mater. 21 906-9
5. De G, Tapfer L, Catalano M, Battaglin G, Caccavale F, Gonella F, Mazzoldi P and Haglund R F Jr 1996 Appl. Phys. Lett. 68 3820-2
6. Babonneau D, Petroff F, Maurice J L, Fettar F, Vaurès A and Naudon A 2000 Appl. Phys. Lett. 76 2892-4
7. Dempsey N M, Ranno L, Givord D, Gonzalo J, Serna R, Fei G T, Petford-Long A K, Doole R C and Hole D E 2001 J. Appl. Phys. 90 6268-74
8. Wang C M, Shutthanandan V, Thevuthasan S and Duscher G 2005 Appl. Phys. Lett. 87 153104
9. Zhao N and Gao M 2009 Adv. Mater. 21 184-7
10. Kharisov B I, Kharissova O V, Yacamán M J and Ortiz U M 2009 Recent Pat. Nanotechnol. 3 81-98
11. Von Borany J, Grötzschel R, Heinig K H, Markwitz A, Matz W, Schmidt B and Skorupa W 1997 Appl. Phys. Lett. 71 3215-7
12. Ren F, Jiang C Z, Liu C and Wang J B 2006 Appl. Phys. Lett. 88 183114
13. Ding X Z, Tay B K, Shi X, Chiah M F, Cheung W Y, Wong S P, Xu J B and Wilson I H 2000 J. Appl. Phys. 88 2745-9
14. Buckmaster R, Hanada T, Kawazoe Y, Cho M W, Yao T F, Urushihara N and Yamamoto A 2005 Nano Lett. 5 771-6
15. Gangopadhyay P, Ravindran T R, Nair K G M, Kalavathi S, Sundaravel B and Panigrahi B K 2007 Appl. Phys. Lett. 90 063108
16. Meldrum A, Haglund R F Jr, Boatner L A and White C W 2001 Adv. Mater. 13 1431-444
17. Amekura H, Plaksin O A, Kono K, Takeda Y and Kishimoto N 2006 J. Phys. D: Appl. Phys. 39 3659-64
18. Buchanan K S, Zhu X B, Meldrum A and Freeman M R 2005 Nano Lett. 5 383-7
19. Yuan C W, Boswell C N, Shin S J, Liao C Y, Guzman J, Ager J W, Haller E E and Chrzan D C 2009 Appl. Phys. Lett. 95 083120
20. Markwitz A and Kennedy J 2009 Int. J. Nano. 6 369-83
21. Markwitz A and White G V 2001 Adv. Mater. 13 1027-30
22. Kennedy J, Markwitz A, Trodahl H J, Ruck B J, Durbin S M and Gao W 2007 J. Electron. Mater. 36 472-82
23. Stepanov A L and Khaibullin I B 2005 Rev. Adv. Mater. Sci. 9 109-29
24. Hopf T and Markwitz A 2010 Surf. Sci. 604 1531-5
25. Tromp R, Rubloff G W, Balk P, LeGoues F K and van Loenen E J 1985 Phys. Rev. Lett. 55 2332-5
26. Hosono H and Imagawa H 1994 Nucl. Instrum. Methods Phys. Res. B 91 510-4
27. Knotek M L and Feibelman P J 1978 Phy. Rev. Lett. 40 964-7
28. Burda C, Chen X, Narayanan R and El-Sayed M A 2005 Chem. Rev. 105 1025-102
29. Al-Attar H and Kakehashi Y 1999 J. Appl. Phys. 86 3265-73