In situ patterning of high-quality crystalline rubrene thin films for high-resolution patterned organic field-effect transistors

ACS Nano

Volumn 5, Issue 10, 2011, Pages 8352-8356

  Lee, Hyeok Moo ^a   Kim, Jae Joon ^a   Choi, Jae Hak ^b   Cho, Sung Oh ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Atomic Energy Research Institute   (South Korea)

Author keywords

organic field effect transistors; organic thin film; rubrene; submicrometer pattern

Indexed keywords

AMBIENT CONDITIONS; CRYSTALLINE FILMS; HIGH QUALITY; HIGH RESOLUTION; IN-SITU; LIFT-OFF PROCESS; ORGANIC THIN FILMS; RUBRENE CRYSTALS; RUBRENE THIN FILMS; RUBRENES; SPATIAL RESOLUTION; SUB-MICROMETER PATTERNS; SUBMICROMETERS;

CRYSTALLINE MATERIALS; THIN FILMS; TRANSISTORS;

ORGANIC FIELD EFFECT TRANSISTORS;

EID: 80054998465     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn203068q     Document Type: Article

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