Towards all-organic field-effect transistors by additive soft lithography

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Volumn 5, Issue 10, 2009, Pages 1117-1122

  Serban, Dana Alina ^b   Greco, Pierpaolo ^a   Melinte, Sorin ^b   Vlad, Alexandru ^b   Dutu, Constantin Augustin ^b   Zacchini, Stefano ^c   Iapalucci, Maria Carmela ^c   Biscarini, Fabio ^a   Cavallini, Massimiliano ^a  

^a CNR   (Italy)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^c UNIVERSITY OF BOLOGNA   (Italy)

Author keywords

Additive manufacturing; Lithography; Organic electronics; Organic field effect transistors

Indexed keywords

ADDITIVE MANUFACTURING; BOTTOM-CONTACT; CHARACTERISTIC LENGTH; CHLOROFORM SOLUTIONS; ELECTRICAL CHARACTERIZATION; ELECTRICAL RESISTIVITY; GATE TERMINALS; ORDERS OF MAGNITUDE; ORGANIC ELECTRONICS; ORGANIC FIELD-EFFECT TRANSISTORS; PD ELECTRODES; PROCESSABLE MATERIALS; SI WAFER; SOFT LITHOGRAPHY; VERSATILE METHODS;

ELECTRIC RESISTANCE; ELECTRODES; LITHOGRAPHY; PALLADIUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

FIELD EFFECT TRANSISTORS;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRICITY; ELECTRODE; METHODOLOGY; NANOTECHNOLOGY; SEMICONDUCTOR;

ELECTRICITY; ELECTRODES; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; TRANSISTORS;

EID: 67649888611     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200801732     Document Type: Article

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