Antireflective properties of disordered Si SWSs with hydrophobic surface by thermally dewetted Pt nanomask patterns for Si-based solar cells

Current Applied Physics

Volumn 12, Issue 1, 2012, Pages 291-298

  Leem, Jung Woo ^a   Chung, Kwan Soo ^a,b   Yu, Jae Su ^a  

^a Kyung Hee University   (South Korea)

^b Dongguk University   (South Korea)

Author keywords

Antireflective properties; Disordered subwavelength structure; Inductively coupled plasma etching; Pt nanoparticles; Thermal dewetting process

Indexed keywords

ANTI-REFLECTION; ANTIREFLECTIVE PROPERTIES; AVERAGE HEIGHT; ETCH MASK; ETCHING PROCESS; HYDROPHOBIC SURFACES; INCIDENT ANGLES; NANO PATTERN; NANOMASKS; PT NANOPARTICLES; PT THIN FILMS; RAPID THERMAL ANNEALING PROCESS; RIGOROUS COUPLED WAVE ANALYSIS; SI-BASED SOLAR CELLS; SILICON SUBSTRATES; SUB-WAVELENGTH STRUCTURES; THERMAL DEWETTING; WATER CONTACT ANGLE; WAVELENGTH RANGES;

BEHAVIORAL RESEARCH; CONTACT ANGLE; ETCHING; HYDROPHOBICITY; INDUCTIVELY COUPLED PLASMA; PLATINUM; RAPID THERMAL ANNEALING; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON OXIDES; SURFACE CHEMISTRY;

SURFACE PROPERTIES;

EID: 80054818899     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2011.06.022     Document Type: Article

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