Analysis of limits for sapphire growth in a micro-pulling-down system

Journal of Crystal Growth

Volumn 335, Issue 1, 2011, Pages 148-159

  Samanta, Gaurab ^a   Yeckel, Andrew ^a   Daggolu, Parthiv ^a   Fang, Haisheng ^b   Bourret Courchesne, Edith D ^b   Derby, Jeffrey J ^a  

^a University of Minnesota   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

A1. Computer simulation; A1. Fluid flows; A1. Heat transfer; B1. Oxide; B2. Scintillator materials

Indexed keywords

A1. COMPUTER SIMULATION; A1. FLUID FLOWS; A1. HEAT TRANSFER; B1. OXIDE; SCINTILLATOR MATERIALS;

COMPUTER SIMULATION; FLOW OF FLUIDS;

SAPPHIRE;

EID: 80054738597     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.09.015     Document Type: Article

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