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Volumn 520, Issue 1, 2011, Pages 320-327
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Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition
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Author keywords
Amorphous titanium oxide; Cluster boundaries; Crystallization temperature; Nickel oxide seed layer; Photocatalytic activity
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Indexed keywords
ACTIVE SURFACE AREA;
AMORPHOUS TITANIUM OXIDE;
ANATASE CRYSTALS;
CHEMICAL VAPOR DEPOSITED;
CLUSTER BOUNDARIES;
CRYSTALLINE STRUCTURE;
CRYSTALLIZATION TEMPERATURE;
FIELD EMISSION SCANNING ELECTRON MICROSCOPES;
FOURIER TRANSFORM INFRARED SPECTROMETRY;
METHYLENE BLUE SOLUTION;
PHOTO-INDUCED SURFACES;
PHOTOCATALYTIC ACTIVITIES;
PHOTOCATALYTIC ACTIVITY;
PHOTOGENERATED ELECTRONS;
PHOTOINDUCED HYDROPHILICITY;
POST ANNEALING;
POST-ANNEALING TEMPERATURE;
SEED LAYER;
SUPER-HYDROPHILICITY;
TEXTURED SURFACE;
TIO;
TITANIUM OXIDE THIN FILMS;
UV-LIGHT IRRADIATION;
WATER DROPLETS;
X RAY DIFFRACTOMETERS;
ANNEALING;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
CHEMICAL BONDS;
CHEMICAL VAPOR DEPOSITION;
CONTACT ANGLE;
CRYSTAL ATOMIC STRUCTURE;
CRYSTAL GROWTH;
CRYSTALLIZATION;
DEPOSITION;
FILM GROWTH;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
HYDROPHILICITY;
MORPHOLOGY;
NICKEL;
NICKEL OXIDE;
OXIDE FILMS;
PHOTOCATALYSIS;
PHOTOELECTRON SPECTROSCOPY;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
SURFACE MORPHOLOGY;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
X RAY PHOTOELECTRON SPECTROSCOPY;
AMORPHOUS FILMS;
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EID: 80054043316
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.06.064 Document Type: Article |
Times cited : (6)
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References (36)
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