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Volumn 520, Issue 1, 2011, Pages 320-327

Effect of nickel oxide seed layers on annealed-amorphous titanium oxide thin films prepared using plasma-enhanced chemical vapor deposition

Author keywords

Amorphous titanium oxide; Cluster boundaries; Crystallization temperature; Nickel oxide seed layer; Photocatalytic activity

Indexed keywords

ACTIVE SURFACE AREA; AMORPHOUS TITANIUM OXIDE; ANATASE CRYSTALS; CHEMICAL VAPOR DEPOSITED; CLUSTER BOUNDARIES; CRYSTALLINE STRUCTURE; CRYSTALLIZATION TEMPERATURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; FOURIER TRANSFORM INFRARED SPECTROMETRY; METHYLENE BLUE SOLUTION; PHOTO-INDUCED SURFACES; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC ACTIVITY; PHOTOGENERATED ELECTRONS; PHOTOINDUCED HYDROPHILICITY; POST ANNEALING; POST-ANNEALING TEMPERATURE; SEED LAYER; SUPER-HYDROPHILICITY; TEXTURED SURFACE; TIO; TITANIUM OXIDE THIN FILMS; UV-LIGHT IRRADIATION; WATER DROPLETS; X RAY DIFFRACTOMETERS;

EID: 80054043316     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.06.064     Document Type: Article
Times cited : (6)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.