Hydrophilic property of SiO2/TiO2 double layer films

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 121-124

  Nakamura, M ^a   Kobayashi, M ^a   Kuzuya, N ^a   Komatsu, T ^b   Mochizuka, T ^a  

^a Research and Development Division   (Japan)

^b Murakami Corporation   (Japan)

Author keywords

Photocatalysis; Silicon dioxide; Titanium dioxide

Indexed keywords

CONTAMINATION; HYDROPHILICITY; PHOTOCATALYSIS; RADIATION; SECONDARY ION MASS SPECTROMETRY; SILICA; TITANIUM DIOXIDE;

DOUBLE LAYER FILM; ORGANIC CONTAMINANTS; UV LIGHT IRRADIATION; VACUUM EVAPORATION;

THIN FILMS;

EID: 33344467231     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.254     Document Type: Conference Paper

References (11)

1. T. Komatsu, Y. Itoh, N. Iwanabe, H. Sato, U.S. Patent No. 5155625, 13. Oct. 1992.
2. Y. Narukawa, T. Masuda, Patent Abstracts of Japan No. 08-244570, 24. Sep. 1996.
3. H. Mozzanega, J.-M. Herrmann, and P. Pichat J. Phys. Chem. 83 1979 2251
4. K. Matsuo, and K. Nakano Appl. Surf. Sci. 33/34 1988 269
5. D.F. Ollis, E. Pelizzetti, and N. Serpone Environ. Sci. Technol. 25 1991 1523
6. H. Yamashita, Y. Ichihashi, M. Harada, G. Stewart, M.A. Fox, and M. Anpo J. Catal. 158 1996 97
7. T. Komatsu, M. Nakamura, U.S. Patent No. 5854708, 29. Dec. 1998.
8. H. Tada Langmuir 11 1995 3281
9. K. Sano, S. Hayashi, S. Wickramanayaka, and Y. Hatanaka Thin Solid Films 281-282 1996 397
10. Z. Jiwei, Y. Tao, Z. Liangying, and Y. Xi Ceram. Int. 25 1999 667
11. C.D. Jaeger, and A. Bard J. Phys. Chem. 83 1979 3146