Interface stress induced hardness enhancement and superelasticity in polytetrafluoroethylene/metal multilayer thin films

Thin Solid Films

Volumn 520, Issue 1, 2011, Pages 404-412

  Kusano, E ^a   Kikuchi, N ^b  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Hardness enhancement; Multilayer thin films; Nanoindentation; Polytetrafluoroethylene; Sputtering; Superelasticity

Indexed keywords

ALUMINOSILICATE GLASS; ANOMALOUS BEHAVIOR; DC MAGNETRON SPUTTERING; FILM HARDNESS; HARDNESS ENHANCEMENT; INTERFACE ENERGY; INTERFACE STRESS; INTERNAL STRESS; INVESTIGATE EFFECTS; LOW SURFACE ENERGY; METAL FILM; METAL LAYER; MINIMUM VALUE; MODULATION PERIOD; MULTI-LAYER THIN FILM; MULTILAYER THIN FILMS; MULTILAYERING; NANO-INDENTATION MEASUREMENTS; NANOINDENTATION ANALYSIS; PTFE/AL; RF-MAGNETRON SPUTTERING; SUPERELASTICITY;

ALUMINOSILICATES; ALUMINUM; COPPER; ELASTICITY; FILM PREPARATION; HARDNESS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MATERIALS PROPERTIES; MODULATION; MULTILAYER FILMS; NANOINDENTATION; POLYTETRAFLUOROETHYLENES; STRESSES; SURFACE CHEMISTRY;

MULTILAYERS;

EID: 80054038342     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.07.034     Document Type: Article

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