Synthesis of ZnO thin films by 40 ps @532 nm laser pulses

Applied Physics A: Materials Science and Processing

Volumn 104, Issue 3, 2011, Pages 871-876

  Ristoscu, C ^a   Socol, M ^b   Socol, G ^a   Mihailescu, I N ^a   Jafer, R ^c   Al Hadeethi, Y ^c   Batani, D ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^c UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

532 NM LASER; A-SPOTS; ABLATED MATERIALS; AFM; AVERAGE SIZE; FS LASER PULSE; INCIDENT LASER; ND : YAG LASERS; PURE ZNO; QUARTZ WAFERS; SEPARATION DISTANCES; SPECTRAL REGION; VACUUM CHAMBERS; ZNO FILMS; ZNO THIN FILM;

DEPOSITION; LASER PULSES; METALLIC FILMS; OPTICAL FILMS; PULSED LASER DEPOSITION; PULSED LASERS; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

NEODYMIUM LASERS;

EID: 80053912494     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-011-6429-6     Document Type: Article

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