UV optical properties of thin film oxide layers deposited by different processes

Applied Optics

Volumn 50, Issue 28, 2011, Pages 5559-5566

  Pellicori, Samuel F ^a   Martinez, Carol L ^b  

^a Pellicori Optical Consulting   (United States)

^b MC Martinez Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DEPOSITION; EXCIMER LASERS; ION BEAM ASSISTED DEPOSITION; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SPUTTERING; THIN FILMS;

ABSORPTION VALUES; DEFECT STATE; DEPOSITION PROCESS; FILM QUALITY; MATERIAL COMPOSITIONS; OPTICAL PROPERTIES OF THIN FILMS; OPTICS LABORATORY; PULSED DC MAGNETRON SPUTTERING;

OPTICAL FILMS;

EID: 80053408799     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.005559     Document Type: Article

References (16)

1. F. Rainer, W. Howard Lowdermilk, D. Milam, C. K. Carniglia, T. Tuttle Hart, and T. L. Lichtenstein, "Materials for optical coatings in the ultraviolet," Appl. Opt. 24, 496-500 (1985).
2. M. Friz and F. Waibel, "Coating materials," in Optical Interference Coatings Norbert Kaiser and Hans, Vol. 88 of Springer Series in Optical Sciences, K. Pulker, ed. (Springer Verlag, 2003).
3. A. V. Tikhonravov, M. K. Trubetskov, T. V. Amotchkina, G. DeBell, V. Pervak, A. K. Sytchkova, M. L. Grilli, and D. Ristau, "Optical parameters of oxide films typically used in optical coating production," Appl. Opt. 50, C75-C85 (2011).
4. N. Kaiser, "Review of the fundamentals of thin-film growth," Appl. Opt. 41, 3053-3060 (2002). (Pubitemid 34685194)
5. R. Thielsch, A. Gatto, J. Heber, and N. Kaiser, "A comparative study of the UV optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition," Thin Solid Films 410, 86-93 (2002). (Pubitemid 34613864)
6. J. Wang, R. L. Maier, and H. Schreiber, "Wavefront control of SiO2-based ultraviolet narrow-bandpass filters prepared by plasma ion-assisted deposition," Appl. Opt. 46, 175-179 (2007). (Pubitemid 46326615)
7. P. Torcino, A. Gatto, M. Alvisi, G. Albrand, N. Kaiser, and C. Amra, "High-reflectivity HfO2=SiO2 ultraviolet mirrors," Appl. Opt. 41, 3256-3261 (2002).
8. O. Buiu, Y. Lu, I. Z. Mitrovic, S. Hall, P. Chalker, and R. J. Potter, "Spectroellipsometric assessment of HfO2 thin films," Thin Solid Films 515, 623-626 (2006). (Pubitemid 44402581)
9. H. Takeuchi, D. Ha, and T. King, "Observation of bulk HfO2 defects by spectroscopic ellipsometry," J. Vac. Sci. Technol. A 22, 1337-1341 (2004).
10. A. Zuber, N. Kaiser, and J. L. Stehle, "Variable angle spectroscopic ellipsometry for deep UV characterization of dielectric coatings," Proc. SPIE 2253, 969-975 (1994).
11. Final Report: "Radiation resistant solar cell coverglass," prepared by S. F. Pellicori and C. L. Martinez, SBIR Phase II project: "Radiation Resistant Solar Cell". Coverglass FA9453-06-C-0045. AFRL Kirtland AFB (2008).
12. L. Gallais, J. Capoulade, J. Natoli, M. Commandré, M. Cathelinaud, C. Koc, and M. Lequime, "Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering," Appl. Opt. 47, C107-C113 (2008).
13. B. von Blanckenhagen, D. Tonova, and J. Ullmann, "Application of the Tauc-Lorentz formulation to the interband absorption of optical coating materials," Appl. Opt. 41, 3137-3141 (2002). (Pubitemid 34685205)
14. O. Stenzel, S. Wilbrandt, M. Schürmann, N. Kaiser, H. Ehlers, M. Mende, D. Ristau, S. Bruns, M. Vergöhl, M. Stolze, M. Held, H. Niederwald, T. Koch, W. Riggers, P. Burdack, G. Mark, R. Schäfer, S. Mewes, M. Bischoff, M. Arntzen, F. Eisenkrämer, M. Lappschies, S. Jakobs, S. Koch, B. Baumgarten, and A. Tünnermann, "Mixed oxide coatings for optics," Appl. Opt. 50 C69 (2011).
15. R. E. Klinger and C. K. Carniglia, "Optical and crystalline inhomogeneity in evaporated zirconia films," Appl. Opt. 24, 3184-3187 (1985).
16. Compound formulation, Materion (formerly CERAC); http://materion.com.