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1
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0034428091
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Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography
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J. Taniguchi, M. Komuro, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima and S. Matsui, "Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography" Jpn. J. Appl. Phys., Vol. 39, pp7070-7074, December 2000. (Pubitemid 32874086)
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Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers
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Taniguchi Jun1
Tokano Yuji2
Miyamoto Iwao3
Komuro Masanori4
Hiroshima Hiroshi5
Kobayashi Kazuhiko6
Miyazaki Takeshi7
Ohyi Hideyuki8
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2
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57249104903
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Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake
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N. Unno, J. Taniguchi, M. Shizuno and Kishikawa, "Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake" J. Vac. Sci. Technol. Vol. B26, pp2390-2393, 2008.
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J. Vac. Sci. Technol.
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Unno, N.1
Taniguchi, J.2
Shizuno, M.3
Kishikawa4
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3
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69549096196
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Roll in and roll out: A path to high-throughput nanoimprint lithography
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August
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C. Stuart and Y. Chen, "Roll in and roll out: A path to high-throughput nanoimprint lithography" ACS Nano., Vol. 3, pp2062-2064, August 2009.
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ACS Nano.
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Stuart, C.1
Chen, Y.2
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4
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67349163246
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Direct fabrication of microstructures on metal roller using stepped rotating lithography and electrons nickel plating
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April
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T.-C. Huang, J.-T. Wu, S.-Y. Yang, P.-H. Huang and S.-H. Chang, "Direct fabrication of microstructures on metal roller using stepped rotating lithography and electrons nickel plating" Microelectron. Eng., Vol. 86, pp615-618, April 2009.
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Microelectron. Eng.
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Huang, T.-C.1
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Yang, S.-Y.3
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Chang, S.-H.5
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5
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67349157146
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Micro-fabrication of polymeric devices using hot roller embossing
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April
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L.P. Yeo, S.H. Ng, Z. Wang, Z. Wang and N.F. de Rooij, "Micro-fabrication of polymeric devices using hot roller embossing" Microelectron. Eng., Vol. 86, pp933-936, April 2009.
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Microelectron. Eng.
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Yeo, L.P.1
Ng, S.H.2
Wang, Z.3
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De Rooij, N.F.5
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6
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42949169953
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Prototype development of a roller imprint system and its application to large area polymer replication for a microstructured optical device
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DOI 10.1016/j.jmatprotec.2007.08.069, PII S0924013607008527
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S.-WYoun, M. Ogiwara., H. Goto, M. Takahashi and R. Maeda, "Prototype development of a roller imprint system and its application to large area polymer replication for a microstructured optical device" J. Mater. Process. Technol., Vol. 202, pp76-85, June 2008 (Pubitemid 351615548)
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Journal of Materials Processing Technology
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Youn, S.-W.1
Ogiwara, M.2
Goto, H.3
Takahashi, M.4
Maeda, R.5
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7
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67349216732
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Fabrication of roll imprint stamp for continuous UV roll imprinting process
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April
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S.-Y. Hwang, S.-H. Hong, H-YJung and H. Lee, "Fabrication of roll imprint stamp for continuous UV roll imprinting process" Microelectron. Eng., Vol. 86, pp642-645, April 2009.
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Microelectron. Eng.
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Hwang, S.-Y.1
Hong, S.-H.2
Jung, H.-Y.3
Lee, H.4
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8
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72849148575
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Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate
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J. Taniguchi and M. Aratani, "Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate" J. Vac. Sci. Technol., Vol. B 27, pp2841-2845, 2009.
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J. Vac. Sci. Technol.
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Taniguchi, J.1
Aratani, M.2
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9
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77952187850
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Desktop type equipment of thermal-assisted UV roller imprinting
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T. Shibazaki, H. Shinohara, T. Hirasawa, N. Sakai, J. Taniguchi, J. Mizuno and S. Shoji, "Desktop Type Equipment of Thermal-assisted UV Roller Imprinting" J. Photopolym Sci Technol., Vol. 22, pp727-730, 2009.
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J. Photopolym Sci Technol.
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Shibazaki, T.1
Shinohara, H.2
Hirasawa, T.3
Sakai, N.4
Taniguchi, J.5
Mizuno, J.6
Shoji, S.7
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