Spectroscopic and morphological investigation of copper oxide thin films prepared by magnetron sputtering at various oxygen ratios

Bulletin of the Korean Chemical Society

Volumn 32, Issue 9, 2011, Pages 3395-3399

  Park, Juyun ^a   Lim, Kyounga ^b   Ramsier, Rex D ^b   Kang, Yong Cheol ^a  

^a Pukyong National University   (South Korea)

^b UNIVERSITY OF AKRON   (United States)

Author keywords

Copper oxide; RF magnetron sputtering; XPS

Indexed keywords

COPPER OXIDE THIN FILMS; CRYSTALLINITIES; DENSITY OF STATE; OXIDATION STATE; OXYGEN GAS; REACTIVE RADIO-FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; X-RAY INDUCED AUGER ELECTRON SPECTROSCOPIES;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; AUGER ELECTRON SPECTROSCOPY; COPPER OXIDES; MAGNETRON SPUTTERING; OXIDE FILMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER;

EID: 80053109904     PISSN: 02532964     EISSN: 12295949     Source Type: Journal    
DOI: 10.5012/bkcs.2011.32.9.3395     Document Type: Article

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