Microstructural comparisons of ultrathin Cu films deposited by ion-beam and dc-magnetron sputtering

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  Prater, W L ^a,e   Allen, E L ^a   Lee, W Y ^b   Toney, M F ^c   Kellock, A ^d   Daniels, J S ^d,f   Hedstrom, J A ^d   Harrell, T ^d,g  

^a SAN JOSE STATE UNIVERSITY   (United States)

^b SAN JOSE RESEARCH CENTER   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^d IBM   (United States)

^e NOVELLUS SYSTEMS INC   (United States)

^f Stanford University   (United States)

^g University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DC-MAGNETRON SPUTTERING; GRAIN REFINEMENT; OXYGEN CONTAINING ATMOSPHERE; ULTRATHIN COPPER FILMS;

CONCENTRATION (PROCESS); COPPER; ELECTRIC RESISTANCE; GIANT MAGNETORESISTANCE; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; MICROSTRUCTURE; SURFACE ROUGHNESS;

ULTRATHIN FILMS;

EID: 18844408122     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1886275     Document Type: Article

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