Valence state of europium doping ions during pulsed-laser deposition

Journal of Physics D: Applied Physics

Volumn 44, Issue 37, 2011, Pages

  Pillonnet, A ^a,b   Pereira, A ^a,b   Marty, O ^a   Champeaux, C ^c  

^a UNIVERSITÉ DE LYON   (France)

^b UNIVERSITÉ LYON 1   (France)

^c UNIVERSITY OF LIMOGES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; EMISSION SPECTROSCOPY; EUROPIUM; EUROPIUM COMPOUNDS; IONS; OXYGEN; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING;

ALUMINA MATRIX; DEPOSITION CHAMBERS; EUROPIUM DOPING; FLUORESCENCE LINE NARROWING; OXYGEN PRESSURE; SELECTIVE EMISSIONS; TIME-OF-FLIGHT EMISSIONS; VALENCE STATE;

PULSED LASERS;

EID: 80052550294     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/37/375402     Document Type: Article

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