Influence of the substrate temperature on BCN films deposited by sequential Pulsed Laser Deposition

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

  Teodorescu, V S ^a   Luches, A ^b   Dinu, R ^c   Zocco, A ^b   Ciobanu, M F ^d   Martino, M ^b   Sandu, V ^a   Dinescu, M ^c  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^b UNIVERSITY OF SALENTO   (Italy)

^c NATIONAL INSTITUTE FOR LASER   (Romania)

^d Nat Inst for Simulators and Simulating Tech   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3042772259     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051501     Document Type: Article

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