Insulating state of ultrathin epitaxial LaNiO3 thin films detected by hard x-ray photoemission

Physical Review B - Condensed Matter and Materials Physics

Volumn 84, Issue 7, 2011, Pages

  Gray, A X ^a,b   Janotti, A ^c   Son, J ^c   Lebeau, J M ^c   Ueda, S ^d   Yamashita, Y ^d   Kobayashi, K ^d   Kaiser, A M ^a,b   Sutarto, R ^e,f   Wadati, H ^e,g   Sawatzky, G A ^e   Van De Walle, C G ^c   Stemmer, S ^c   Fadley, C S ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c University of California   (United States)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^e UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^f CANADIAN LIGHT SOURCE INC   (Canada)

^g UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 80052413180     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.84.075104     Document Type: Article

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