Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2

Nanotechnology

Volumn 22, Issue 38, 2011, Pages

  Yang, Joel K W ^a   Chen, Yunjie ^b,c   Huang, Tianli ^b   Duan, Huigao ^a   Thiyagarajah, Naganivetha ^c   Hui, Hui Kim ^a   Leong, Siang Huei ^b   Ng, Vivian ^c  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BIT-PATTERNED MEDIA; FILM DEPOSITION; HIGH RESOLUTION; HIGH-VOLUME MANUFACTURING; MAGNETIC BITS; MAGNETIC ISOLATION; PATTERN FIDELITY; PATTERN TRANSFER PROCESS; PATTERNING METHODS; RESOLUTION LIMITS; TEMPLATED; ULTRAHIGH DENSITY;

MAGNETIC FORCE MICROSCOPY;

NANOIMPRINT LITHOGRAPHY;

EID: 80052152407     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/38/385301     Document Type: Article

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