Improvement of CMOS-MEMS accelerometer using post-CMOS selective electroplating technique

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Volumn , Issue , 2011, Pages 1002-1005

  Liu, Yu Chia ^a   Tsai, Ming Han ^a   Tang, Tsung Lin ^a   Fang, Weileun ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Accelerometer; CMOS MEMS; Electroplating

Indexed keywords

CAPACITIVE ACCELEROMETERS; CMOS-MEMS; CMOS-MEMS ACCELEROMETER; ELECTROPLATED NI; ELECTROPLATING TECHNIQUE; LOW TEMPERATURES; MEMS-STRUCTURE; METAL ELECTROPLATING; METAL LAYER; NI ELECTROPLATING; POST-CMOS; SEED LAYER; SIMPLE APPROACH; STRUCTURE DEFORMATION; TEMPERATURE VARIATION;

ACCELEROMETERS; ACTUATORS; DEFORMATION; MICROSYSTEMS; SOLID-STATE SENSORS;

ELECTROPLATING;

EID: 80052120825     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/TRANSDUCERS.2011.5969153     Document Type: Conference Paper

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