Bionano crystallized poly-Si film for increasing tensile stress in MEMS/NEMS device structures

2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Volumn , Issue , 2011, Pages 1733-1736

  Kumagai, S ^a,c   Miyachi, S ^a   Yamashita, I ^b,c   Uraoka, Y ^b,c   Sasaki, M ^a,c  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

crystallization induced stress; ferritin; Meal induced lateral crystallization; nanoparticles

Indexed keywords

AMORPHOUS SI FILMS; APOFERRITIN; CATALYST MATERIAL; CRYSTALLIZATION-INDUCED STRESS; DEVICE STRUCTURES; ELECTRON BACK SCATTER DIFFRACTION; FERRITIN; MEAL-INDUCED LATERAL CRYSTALLIZATION; MEMS/NEMS; METAL-INDUCED LATERAL CRYSTALLIZATION; NI NANOPARTICLES; POLY-SI FILMS; SUPRAMOLECULES;

ACTUATORS; AMORPHOUS SILICON; CRYSTALLIZATION; MICROSYSTEMS; NANOPARTICLES; SILICON; SOLID STATE DEVICE STRUCTURES; SOLID-STATE SENSORS; TENSILE STRESS;

AMORPHOUS FILMS;

EID: 80052114869     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/TRANSDUCERS.2011.5969814     Document Type: Conference Paper

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