Quantum reflection of ultracold atoms from thin films, graphene and semiconductor heterostructures

New Journal of Physics

Volumn 13, Issue , 2011, Pages

  Judd, T E ^a   Scott, R G ^b   Martin, A M ^c   Kaczmarek, B ^d   Fromhold, T M ^d  

^a UNIVERSITY OF TÜBINGEN   (Germany)

^b UNIVERSITY OF TRENTO   (Italy)

^c UNIVERSITY OF MELBOURNE   (Australia)

^d UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM CLOUD; ATOMIC MIRRORS; BULK-MATTER; ELECTRICAL MEASUREMENT; ELECTRICAL RESISTANCES; QUANTUM REFLECTION; REAL TIME; REFLECTION PROBABILITY; REFLECTION PROCESS; RESISTANCE CHANGE; SEMICONDUCTOR HETEROSTRUCTURES; TEMPORAL CHANGE; THIN DIELECTRIC FILM; ULTRACOLD ATOMS;

CRYSTALS; DIELECTRIC FILMS; ELECTRIC VARIABLES MEASUREMENT; GRAPHENE; HETEROJUNCTIONS; MIRRORS; PROBABILITY; TWO DIMENSIONAL; TWO DIMENSIONAL ELECTRON GAS;

ATOMS;

EID: 80051984526     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/13/8/083020     Document Type: Article

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