Ultrafast photoluminescence spectroscopy of H- and O-terminated nanocrystalline diamond films

Diamond and Related Materials

Volumn 20, Issue 8, 2011, Pages 1155-1159

  Dzurnak B ^a   Trojanek F ^a   Preclikova J ^a   Kromka, A ^b   Rezek, B ^b   Maly P ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Nanocrystalline diamond; Photoluminescence; Surface; Ultrafast spectroscopy

Indexed keywords

AIR PRESSURES; AMBIENT AIR PRESSURE; CARRIER TRAPPING; CHARGE CARRIER DYNAMICS; DECAY RATE; FEMTOSECOND LIGHT PULSE; FEMTOSECONDS; FUSED SILICA SUBSTRATES; H-TERMINATION; LIGHT IRRADIATIONS; LIGHT-INDUCED CHANGES; MICROWAVE PLASMA; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; NANODIAMOND FILMS; PHOTOLUMINESCENCE DECAY CURVES; PHOTOLUMINESCENCE INTENSITIES; POWER LAW DECAY; SUB-SURFACES; ULTRA-FAST; ULTRAFAST SPECTROSCOPY;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DECAY (ORGANIC); DIAMONDS; FUSED SILICA; IRRADIATION; PHOTOLUMINESCENCE; PHOTOLUMINESCENCE SPECTROSCOPY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SURFACE STRUCTURE;

DIAMOND FILMS;

EID: 80051791869     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.06.025     Document Type: Article

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