SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 158, Issue 8, 2011, Pages

Post plasma etch residue removal in dilute HF solutions

(3) Thanu, D P R a Raghavan, S a Keswani, M a

a University of Arizona (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AERATED CONDITIONS; DEAERATED CONDITIONS; DILUTE HF SOLUTIONS; NOVOLAK; PHOTORESIST FILM; PLASMA ETCH; POST-PLASMA; REMOVAL RATE; RESIDUE REMOVAL; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FLUORINE; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROFLUORIC ACID;

EID: 80051741318 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3597618 Document Type: Article

Times cited : (11)

References (30)

1
- 49749085683
- 10.1143/JJAP.47.1435
- H. Abe, M. Yoneda, and N. Fugiwara, Jpn. J. Appl. Phys. Part 1, 47, 1435 (2008). 10.1143/JJAP.47.1435
- (2008) Jpn. J. Appl. Phys. Part 1 , vol.47 , pp. 1435
- Abe, H.¹ Yoneda, M.² Fugiwara, N.³

2
- 21644451468
- C. Reid, T. Suzuki, and T. Hiraga, Solid State Technol., 48, 47 (2005).
- (2005) Solid State Technol. , vol.48 , pp. 47
- Reid, C.¹ Suzuki, T.² Hiraga, T.³

3
- 41549159487
- 10.1557/PROC-0990-B08-25
- N. Venkataraman, A. Muthukumaran, and S. Raghavan, Mater. Res. Soc. Symp., Proc. 990, 197 (2007). 10.1557/PROC-0990-B08-25
- (2007) Mater. Res. Soc. Symp., Proc. , vol.990 , pp. 197
- Venkataraman, N.¹ Muthukumaran, A.² Raghavan, S.³

4
- 80051758964
- Ph.D. Dissertation, Department of Chemical Engineering, Georgia Institute of Technology
- C. Timmons, Ph.D. Dissertation, Department of Chemical Engineering, Georgia Institute of Technology (2004).
- (2004)
- Timmons, C.¹

5
- 80051712453
- U.S. Pat. 6,777,380
- R. J. Small, B. P. Patel, D. Holmes, J. Daviot, and C. Reid, U.S. Pat. 6,777,380 (2004).
- (2004)
- Small, R.J.¹ Patel, B.P.² Holmes, D.³ Daviot, J.⁴ Reid, C.⁵

6
- 79960219560
- M. A. Lester, Semicond. Int., 3, 48 (2001).
- (2001) Semicond. Int. , vol.3 , pp. 48
- Lester, M.A.¹

7
- 0036504557
- Effect of de-ionized water parameters rinse on postmetal etch residue removal using semiaqueous cleaning chemistries
- DOI 10.1116/1.1463070
- R. Small, S. Kirk, and M. Cernat, J. Vac. Sci. Technol. B., 20, 635 (2002). 10.1116/1.1463070 (Pubitemid 34460186)
- (2002) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.20 , Issue.2 , pp. 635-639
- Small, R.¹ Kirk, S.² Cernat, M.³

8
- 0008932462
- The Electrochemical Society
- D. Peters, Proceedings of the 198th Electrochemical Society, The Electrochemical Society, pp. 541-546 (2000).
- (2000) Proceedings of the 198th Electrochemical Society , pp. 541-546
- Peters, D.¹

9
- 77955229725
- 10.1016/j.mee.2009.10.008
- N. Venkataraman and S. Raghavan, Microelectron. Eng., 87, 1689 (2010). 10.1016/j.mee.2009.10.008
- (2010) Microelectron. Eng. , vol.87 , pp. 1689
- Venkataraman, N.¹ Raghavan, S.²

10
- 58149262843
- 10.1016/j.mee.2008.09.029
- Q. T. Le, M. Claes, T. Conard, E. Kesters, M. Lux, and G. Vereecke, Microelectron. Eng., 86, 181 (2009). 10.1016/j.mee.2008.09.029
- (2009) Microelectron. Eng. , vol.86 , pp. 181
- Le, Q.T.¹ Claes, M.² Conard, T.³ Kesters, E.⁴ Lux, M.⁵ Vereecke, G.⁶

11
- 0042513607
- 10.1016/S0921-5107(02)00745-6
- A. Danel, M. Veillerot, O. Louveau, C. Millet, and F. Tardif, Mater. Sci. Eng., B 102, 30 (2003). 10.1016/S0921-5107(02)00745-6
- (2003) Mater. Sci. Eng., B , vol.102 , pp. 30
- Danel, A.¹ Veillerot, M.² Louveau, O.³ Millet, C.⁴ Tardif, F.⁵

12
- 9644291749
- 10.1016/j.mee.2004.08.006
- D. Lu, R. Kumar, C. K. Chang, A. Y. Du, and T. K. S. Wong, Microelectron. Eng., 77, 63 (2005). 10.1016/j.mee.2004.08.006
- (2005) Microelectron. Eng. , vol.77 , pp. 63
- Lu, D.¹ Kumar, R.² Chang, C.K.³ Du, A.Y.⁴ Wong, T.K.S.⁵

13
- 33749332321
- Copper in organic acid based cleaning solutions
- DOI 10.1116/1.2335866
- C. Pernel, J. Farkas, and D. Louis, J. Vac. sci. Technol. B, 24, 2467 (2006). 10.1116/1.2335866 (Pubitemid 44496243)
- (2006) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.24 , Issue.5 , pp. 2467-2471
- Pernel, C.¹ Farkas, J.² Louis, D.³

14
- 0013204958
- A Novel Method of Etching Copper Oxide Using Acetic Acid
- DOI 10.1149/1.1409400
- K. L. Chavez and D. W. Hess, J. Electrochem. Soc., 148, 640 (2001). 10.1149/1.1409400 (Pubitemid 33693836)
- (2001) Journal of the Electrochemical Society , vol.148 , Issue.11
- Chavez, K.L.¹ Hess, D.W.²

15
- 75849131319
- 10.4028/www.scientific.net/SSP.145-146.295
- L. Broussous, W. Puyrenier, D. Rebiscoul, V. Rouessac, and A. Ayral, Solid State Phenom., 145, 295 (2009). 10.4028/www.scientific.net/SSP.145-146.295
- (2009) Solid State Phenom. , vol.145 , pp. 295
- Broussous, L.¹ Puyrenier, W.² Rebiscoul, D.³ Rouessac, V.⁴ Ayral, A.⁵

16
- 33751252001
- Study of the post-etch cleaning compatibility with dense and porous ULK materials - characterization of the process impact
- DOI 10.1016/j.mee.2006.10.025, PII S0167931706005296
- D. Rebiscoul, B. Puyrenier, L. Broussous, D. Louis, and G. Passemard, Microelectron. Eng., 83, 2319 (2006). 10.1016/j.mee.2006.10.025 (Pubitemid 44792820)
- (2006) Microelectronic Engineering , vol.83 , Issue.11-12 , pp. 2319-2323
- Rebiscoul, D.¹ Puyrenier, B.² Broussous, L.³ Louis, D.⁴ Passemard, G.⁵

17
- 34648846042
- Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process
- DOI 10.1016/j.mee.2007.07.001, PII S0167931707006363
- L. Broussous, W. Puyrenier, D. Rebiscoul, V. Rouessac, and A. Ayral, Microelectron. Eng., 84, 2600 (2007). 10.1016/j.mee.2007.07.001 (Pubitemid 47454656)
- (2007) Microelectronic Engineering , vol.84 , Issue.11 , pp. 2600-2605
- Broussous, L.¹ Puyrenier, W.² Rebiscoul, D.³ Rouessac, V.⁴ Ayral, A.⁵

18
- 74949143030
- 10.1149/1.3202642
- D. P. R. Thanu, N. Venkataraman, S. Raghavan, and O. Mahdavi, ECS Trans., 25 (5), 109 (2009). 10.1149/1.3202642
- (2009) ECS Trans. , vol.25 , Issue.5 , pp. 109
- Thanu, D.P.R.¹ Venkataraman, N.² Raghavan, S.³ Mahdavi, O.⁴

19
- 0031186611
- 10.1149/1.1837856
- K. Ueno, V. M. Donnelly, and T. Kikkawa, J. Electrochem. Soc., 144, 2565 (1997). 10.1149/1.1837856
- (1997) J. Electrochem. Soc. , vol.144 , pp. 2565
- Ueno, K.¹ Donnelly, V.M.² Kikkawa, T.³

20
- 0037701654
- 10.4028/www.scientific.net/SSP.92.263
- L. Broussous, O. Hinsinger, S. Favier, and P. Besson, Solid State Phenom., 92, 263 (2003). 10.4028/www.scientific.net/SSP.92.263
- (2003) Solid State Phenom. , vol.92 , pp. 263
- Broussous, L.¹ Hinsinger, O.² Favier, S.³ Besson, P.⁴

21
- 74949094986
- 10.1149/1.3202641
- S. Suhard, M. Claes, J. Loh, G. Vereecke, M. Pantouvaki, S. Demuynck, B. Vereecke, and G. Beyer, ECS Trans., 25 (5), 101 (2009). 10.1149/1.3202641
- (2009) ECS Trans. , vol.25 , Issue.5 , pp. 101
- Suhard, S.¹ Claes, M.² Loh, J.³ Vereecke, G.⁴ Pantouvaki, M.⁵ Demuynck, S.⁶ Vereecke, B.⁷ Beyer, G.⁸

22
- 0028413782
- 10.1149/1.2054861
- Y. Y. Suk and M. Marek, J. Electrochem. Soc., 141, 940 (1994). 10.1149/1.2054861
- (1994) J. Electrochem. Soc. , vol.141 , pp. 940
- Suk, Y.Y.¹ Marek, M.²

23
- 0003459529
- Perkin-Elmer Co, Minnesota
- J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Hand book of X-ray Photoelectron Spectrocopy, Perkin-Elmer Co, Minnesota (1995).
- (1995) Hand Book of X-ray Photoelectron Spectrocopy
- Moulder, J.F.¹ Stickle, W.F.² Sobol, P.E.³ Bomben, K.D.⁴

24
- 20144362944
- Analytical characterization of bioactive fluoropolymer ultra-thin coatings modified by copper nanoparticles
- DOI 10.1007/s00216-004-2761-4
- N. Cioffi, N. Ditaranto, L. Torsi, R. A. Picca, L. Sabbatini, A. Valentini, L. Novello, G. Tantillo, T. B. Zacheo, and P. G. Sambonin, Anal. Bioanal. Chem., 381, 607 (2005). 10.1007/s00216-004-2761-4 (Pubitemid 40379331)
- (2005) Analytical and Bioanalytical Chemistry , vol.381 , Issue.3 , pp. 607-616
- Cioffi, N.¹ Ditaranto, N.² Torsi, L.³ Picca, R.A.⁴ Sabbatini, L.⁵ Valentini, A.⁶ Novello, L.⁷ Tantillo, G.⁸ Bleve-Zacheo, T.⁹ Zambonin, P.G.¹⁰

25
- 0029521408
- 10.1016/0040-6090(95)06913-5
- D. Rats, L. Vandenbulcke, R. Herbin, R. Benoit, R. Erre, V. Serin, and J. Sevely, Thin Solid Films, 270, 177 (1995). 10.1016/0040-6090(95)06913-5
- (1995) Thin Solid Films , vol.270 , pp. 177
- Rats, D.¹ Vandenbulcke, L.² Herbin, R.³ Benoit, R.⁴ Erre, R.⁵ Serin, V.⁶ Sevely, J.⁷

26
- 0001618987
- 10.1103/PhysRevB.48.8560
- J. Kawai, K. Maeda, and K. Nakajima, Phys. Rev. B, 48, 8560 (1993). 10.1103/PhysRevB.48.8560
- (1993) Phys. Rev. B , vol.48 , pp. 8560
- Kawai, J.¹ Maeda, K.² Nakajima, K.³

27
- 32344447722
- 4 plasma-treated CuO nanowires
- DOI 10.1016/j.cplett.2005.11.087, PII S0009261405018154
- Y. W. Zhu, A. M. Moo, T. Yu, X. J. Xu, X. J. Gao, Y. J. Liu, C. T. Lim, Z. X. Shen, C. K. Ong, A. T. S. Wee, Chem. Phys. Lett., 419, 458 (2006). 10.1016/j.cplett.2005.11.087 (Pubitemid 43220512)
- (2006) Chemical Physics Letters , vol.419 , Issue.4-6 , pp. 458-463
- Zhu, Y.W.¹ Moo, A.M.² Yu, T.³ Xu, X.J.⁴ Gao, X.Y.⁵ Liu, Y.J.⁶ Lim, C.T.⁷ Shen, Z.X.⁸ Ong, C.K.⁹ Wee, A.T.S.¹⁰ Thong, J.T.L.¹¹ Sow, C.H.¹²

28
- 0003715129
- http://srdata.nist.gov/xps/, last accessed August 26, 2010
- C. D. Wagner, A. V. Naumkin, A. K. Vass, J. W. Allison, C. J. Powell, and J. R. Rumble, NIST X-ray Photoelectron Spectroscopy Database, http://srdata.nist.gov/xps/, last accessed August 26, 2010.
- NIST X-ray Photoelectron Spectroscopy Database
- Wagner, C.D.¹ Naumkin, A.V.² Vass, A.K.³ Allison, J.W.⁴ Powell, C.J.⁵ Rumble, J.R.⁶

29
- 84890001102
- 2nd Ed., John Wiley Sons, Inc., New York
- E. Barsoukov and J. R. Macdonald, in Impedance Spectroscopy-Theory, Experiment and Applications, 2nd Ed., John Wiley Sons, Inc., New York (2005).
- (2005) Impedance Spectroscopy-Theory, Experiment and Applications
- Barsoukov, E.¹ MacDonald, J.R.²

30
- 0026897570
- 10.1149/1.2069514
- T. P. Moffat and R. M. Latanision, J. Electrochem. Soc., 139, 1869 (1992). 10.1149/1.2069514
- (1992) J. Electrochem. Soc. , vol.139 , pp. 1869
- Moffat, T.P.¹ Latanision, R.M.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.