Surface treatments of indium tin oxide films by using high density plasma

Thin Solid Films

Volumn 519, Issue 20, 2011, Pages 6824-6828

  Wi, Jae Hyung ^a   Woo, Jong Chang ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Hydrochloric acid; Indium tin oxide; Inductively coupled plasma; Oxygen; Ultraviolet photoelectron spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL COMPOSITIONS; DONOR CONCENTRATIONS; ELECTRON STRUCTURES; HCL SOLUTION; HIGH DENSITY PLASMAS; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; INDUCTIVELY-COUPLED; PLASMA TREATMENT; UPS/XPS;

ELECTRONS; FERMI LEVEL; HYDROCHLORIC ACID; INDIUM; INDIUM COMPOUNDS; INDUCTIVELY COUPLED PLASMA; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; SURFACE TREATMENT; TIN; TIN OXIDES; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; WORK FUNCTION; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 80051549632     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.076     Document Type: Conference Paper

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