The structure and mechanism of porous silica films by sol-gel method using poly(ethylene glycol) and side-chain polyether modified polydimethylsiloxane with terminal Si-CH 3 as templates

Journal of Materials Science: Materials in Electronics

Volumn 22, Issue 8, 2011, Pages 944-948

  Dong, Dong ^a   Liu, Xiaobo ^a   Hu, Wencheng ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; CRACK FREE; FT-IR SPECTRUM; NANOPOROUS STRUCTURES; POLYMER TEMPLATES; PORE FORMATION; POROUS SILICA FILMS; SCANNING ELECTRON MICROSCOPE; SIDE-CHAINS; SILICA FILM; SOL-GEL PROCESSING;

DIFFERENTIAL THERMAL ANALYSIS; ETHERS; ETHYLENE; GELS; GLYCOLS; POLYETHYLENE GLYCOLS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICONES; SOL-GELS; SOLS; THERMOGRAVIMETRIC ANALYSIS;

SOL-GEL PROCESS;

EID: 80051549285     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-010-0241-5     Document Type: Article

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