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Applied Surface Science

Volumn 257, Issue 22, 2011, Pages 9461-9465

Electrical properties of vacuum-annealed titanium-doped indium oxide films

(3) Yan, L T a Rath, J K b Schropp, R E I b

a BEIJING JIAOTONG UNIVERSITY (China)

b UTRECHT UNIVERSITY (Netherlands)

Author keywords

Amorphous; Annealing; Electrical properties; Optical transmission; Sputtering deposition

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ANNEALING; CRYSTALLINE MATERIALS; ELECTRIC PROPERTIES; ELECTRON MOBILITY; INDIUM COMPOUNDS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; TITANIUM OXIDES;

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; CRYSTALLINE STRUCTURE; DEGREE OF CRYSTALLINITY; RADIO FREQUENCY MAGNETRON SPUTTERING; SPUTTERING DEPOSITION; TITANIUM-DOPED INDIUM OXIDE; TRANSPARENT CONDUCTIVE OXIDES;

OXIDE FILMS;

EID: 80051548340 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.06.035 Document Type: Article

Times cited : (28)

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