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Volumn 24, Issue 1-2, 2010, Pages 64-68
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Characterizing crystalline chromium oxide thin film growth parameters
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Author keywords
[No Author keywords available]
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Indexed keywords
CHROMIUM OXIDES;
CYLINDRICAL TARGET;
DEPOSITED FILMS;
ENERGY DISPERSIVE X-RAY SPECTROSCOPY ANALYSIS;
ISOFLUX;
LOW TEMPERATURES;
MID-FREQUENCY;
NANOINDENTATION TESTS;
OXYGEN PLASMAS;
RF MAGNETRONS;
SPUTTERING TECHNIQUES;
STAINLESS STEEL SUBSTRATES;
STEEL SUBSTRATE;
SUBSTRATE BIASING;
ARGON;
CHROMIUM;
CRYSTALLINE MATERIALS;
DC POWER TRANSMISSION;
HARDNESS;
MAGNETRONS;
NANOINDENTATION;
OXYGEN;
PLASMA DEPOSITION;
SPUTTER DEPOSITION;
STAINLESS STEEL;
SUBSTRATES;
THIN FILMS;
X RAY SPECTROSCOPY;
FILM GROWTH;
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EID: 77957261771
PISSN: 16065131
EISSN: 16058127
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (16)
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References (15)
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