Effect of thickness on optoelectrical properties of Mo-doped indium oxide films

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 3046-3048

  Gupta, R K ^a   Ghosh, K ^a   Patel, R ^a   Kahol, P K ^a  

^a MISSOURI STATE UNIVERSITY   (United States)

Author keywords

Electrical properties; Indium oxide; Optical materials and properties; Semiconductor; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; INDIUM COMPOUNDS; MOLYBDENUM OXIDE; PULSED LASER DEPOSITION; SEMICONDUCTING INDIUM; SEMICONDUCTOR MATERIALS; SURFACE ROUGHNESS; THICK FILMS; THIN FILMS; X RAY DIFFRACTION;

FILM CRYSTALLINITY; INDIUM OXIDE; INDIUM OXIDE FILMS; MOLYBDENUM DOPED INDIUM OXIDE FILMS; OPTICAL MATERIALS AND PROPERTIES; OPTOELECTRICAL PROPERTIES; PULSED-LASER DEPOSITION TECHNIQUE; ROOT MEAN SQUARE;

OXIDE FILMS;

EID: 56949106811     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.08.077     Document Type: Article

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