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Volumn 257, Issue 22, 2011, Pages 9639-9642
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Effect of the heat treatment on the infrared emissivity of indium tin oxide (ITO) films
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Author keywords
Direct current magnetron sputtering; Heat treatment; Indium tin oxide films; Infrared emissivity
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Indexed keywords
ELECTROMAGNETIC WAVE EMISSION;
HEAT TREATMENT;
INDIUM COMPOUNDS;
ITO GLASS;
MAGNETRON SPUTTERING;
SUBSTRATES;
AFTER-HEAT TREATMENT;
CRYSTALLINE PHASIS;
DIRECT CURRENT MAGNETRON SPUTTERING;
FOUR-POINT PROBE METHOD;
HALL MEASUREMENTS;
HEATING AND COOLING;
INDIUM TIN OXIDE FILMS;
INFRARED EMISSIVITY;
TIN OXIDES;
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EID: 80051545190
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2011.06.089 Document Type: Article |
Times cited : (40)
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References (14)
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