Control of superhydrophilicity/superhydrophobicity using silicon nanowires via electroless etching method and fluorine carbon coatings

Langmuir

Volumn 27, Issue 16, 2011, Pages 10148-10156

  Kim, Beom Seok ^a   Shin, Sangwoo ^a   Shin, Seung Jae ^a   Kim, Kyung Min ^a   Cho, Hyung Hee ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON COATING; CRITICAL HEIGHT; DESIGN GUIDELINES; DESIGN PARAMETERS; ELECTROLESS; ETCHING METHOD; LONG TERM STABILITY; NANOSCALE STRUCTURE; ROBUST CRITERIA; SILICON NANOWIRES; STATE STABILITY; SUPER-HYDROPHILIC; SUPER-HYDROPHILICITY; SUPERHYDROPHILIC SURFACE; SUPERHYDROPHOBIC; SUPERHYDROPHOBICITY; SURFACE FREE ENERGY; TOPDOWN;

COATINGS; FLUORINE; FREE ENERGY; HYDROPHOBICITY; MICROMETERS; SURFACE ROUGHNESS;

NANOWIRES;

CARBON; FLUORINE; NANOWIRE; SILICON;

ARTICLE; CHEMICAL PHENOMENA; CHEMISTRY;

CARBON; FLUORINE; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; NANOWIRES; SILICON;

EID: 80051487162     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la200940j     Document Type: Article

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