Fabrication and characterization of ultra-high resolution multilayer-coated blazed gratings

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 649, Issue 1, 2011, Pages 156-159

  Voronov, Dmitriy L ^a   Anderson, Erik H ^a   Cambie, Rossana ^a   Dhuey, Scott ^a   Gullikson, Eric M ^a   Salmassi, Farhad ^a   Warwick, Tony ^a   Yashchuk, Valeriy V ^a   Padmore, Howard A ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Atomic force microscopy; Blazed grating; Diffraction efficiency; Diffraction grating; e Beam lithography; EUV; Multilayer coating; Soft X rays; Wet anisotropic etch

Indexed keywords

ANISOTROPIC ETCH; BLAZED GRATING; E-BEAM LITHOGRAPHY; EUV; MULTILAYER COATING; SOFT X-RAY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DIFFRACTION; FABRICATION; SUN; X RAY LITHOGRAPHY; X RAY SPECTROSCOPY;

MULTILAYERS;

EID: 79961167090     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2010.11.064     Document Type: Conference Paper

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