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Volumn 649, Issue 1, 2011, Pages 160-162
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Development of in situ, at-wavelength metrology for soft X-ray nano-focusing
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Author keywords
KB mirror; Long trace profiler; Metrology; Optical slope metrology; Synchrotron radiation; Wavefront measurements; X ray
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Indexed keywords
ADVANCED LIGHT SOURCES;
ALIGNMENT METHODS;
AT-WAVELENGTH;
BEAM LINES;
HIGH-ACCURACY;
IN-SITU;
KB MIRROR;
KIRKPATRICK-BAEZ MIRROR;
LONG TRACE PROFILER;
NANO-FOCUSING;
OPTICAL SLOPE METROLOGY;
SLOPE MEASUREMENT TECHNIQUE;
SOFT X-RAY;
SPOT SIZES;
WAVEFRONT MEASUREMENTS;
LIGHT SOURCES;
MIRRORS;
OPTICAL TESTING;
UNITS OF MEASUREMENT;
WAVEFRONTS;
X RAYS;
MEASUREMENTS;
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EID: 79961165924
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nima.2010.10.134 Document Type: Conference Paper |
Times cited : (15)
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References (12)
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