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Volumn 649, Issue 1, 2011, Pages 160-162

Development of in situ, at-wavelength metrology for soft X-ray nano-focusing

Author keywords

KB mirror; Long trace profiler; Metrology; Optical slope metrology; Synchrotron radiation; Wavefront measurements; X ray

Indexed keywords

ADVANCED LIGHT SOURCES; ALIGNMENT METHODS; AT-WAVELENGTH; BEAM LINES; HIGH-ACCURACY; IN-SITU; KB MIRROR; KIRKPATRICK-BAEZ MIRROR; LONG TRACE PROFILER; NANO-FOCUSING; OPTICAL SLOPE METROLOGY; SLOPE MEASUREMENT TECHNIQUE; SOFT X-RAY; SPOT SIZES; WAVEFRONT MEASUREMENTS;

EID: 79961165924     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2010.10.134     Document Type: Conference Paper
Times cited : (15)

References (12)
  • 1
    • 77956815097 scopus 로고    scopus 로고
    • X-ray Mirror Metrology
    • 3rd ed. M. Bass, McGraw-Hill
    • P.Z. Takacs X-ray Mirror Metrology 3rd ed. M. Bass, Handbook of Optics vol. V 2009 McGraw-Hill
    • (2009) Handbook of Optics
    • Takacs, P.Z.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.