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Volumn 99, Issue 4, 2011, Pages

Enhancement-mode buried strained silicon channel quantum dot with tunable lateral geometry

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING CONDITION; DC VOLTAGE; ENHANCEMENT-MODE; GATE STACKS; HALL BARS; PROCESS FLOWS; QUANTUM DOT NANOSTRUCTURES; STRAINED SILICON CHANNEL; THERMAL BUDGET;

EID: 79961071753     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3615288     Document Type: Article
Times cited : (32)

References (17)
  • 14
    • 36449009831 scopus 로고    scopus 로고
    • Thermal stability of undoped strained Si channel SiGe heterostructures
    • DOI 10.1063/1.115644, PII S0003695196043148
    • H. Klauk, T. N. Jackson, S. F. Nelson, and J. O. Chu, Appl. Phys. Lett. 68, 1975 (1996). 10.1063/1.115644 (Pubitemid 126688443)
    • (1996) Applied Physics Letters , vol.68 , Issue.14 , pp. 1975-1977
    • Klauk, H.1    Jackson, T.N.2    Nelson, S.F.3    Chu, J.O.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.