Implanted manganese redistribution in si after He+ irradiation and hydrogen pulse plasma treatment

Nukleonika

Volumn 56, Issue 1, 2011, Pages 5-8

  Werner, Zbigniew ^a   Pochrybniak, Cezary ^a   Barlak, Marek ^a   Piekoszewski, Jerzy ^a,b   Korman, Andrzej ^a   Heller, Rene ^c   Szymczyk, Władysław ^a   Bocheńska, Katarzyna ^a  

^a SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^b INSTITUTE OF NUCLEAR CHEMISTRY AND TECHNOLOGY   (Poland)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Dilute magnetic semiconductors (DMS); Ion beam induced epitaxial crystallization (IBIEC); Mn implanted Si

Indexed keywords

EID: 79960859798     PISSN: 00295922     EISSN: 15085791     Source Type: Journal    
DOI: None     Document Type: Article

References (23)

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