Reactive ion etching of carbon nanowalls

Japanese Journal of Applied Physics

Volumn 50, Issue 7 PART 1, 2011, Pages

  Kondo, Shingo ^a   Kondo, Hiroki ^a   Miyawaki, Yudai ^a   Sasaki, Hajime ^a   Kano, Hiroyuki ^a,b   Hiramatsu, Mineo ^a,c   Hori, Masaru ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b NU Eco Engineering Co Ltd   (Japan)

^c MEIJO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM SURFACES; CAPACITIVELY COUPLED; CARBON NANOWALLS; ELECTRONIC DEVICE; GRAPHENE SHEETS; HIGH RATE; INTERFACE LAYER; MEMBRANE FILTERS; RADICAL INJECTION; SI SUBSTRATES;

CHEMICAL VAPOR DEPOSITION; GRAPHENE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON;

REACTIVE ION ETCHING;

EID: 79960681917     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.075101     Document Type: Article

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