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Volumn 328, Issue 1, 2011, Pages 25-29

Development of phase-pure CuAlO2 thin films grown on c-plane sapphire substrates prepared by RF sputtering

Author keywords

A1. Annealing; A3. RF Sputtering; B1. Oxides; B2. Transparent conducting oxides

Indexed keywords

A1. ANNEALING; ANNEALING PROCESS; AS-DEPOSITED FILMS; B1. OXIDES; B2. TRANSPARENT CONDUCTING OXIDES; C-PLANE SAPPHIRE; C-PLANE SAPPHIRE SUBSTRATES; CERAMIC TARGET; DEPOSITION TEMPERATURES; ORDERS OF MAGNITUDE; P-TYPE CONDUCTIVITY; POST ANNEALING; RADIO FREQUENCIES; RF-SPUTTERING; ROOM TEMPERATURE; SAPPHIRE SUBSTRATES; VISIBLE REGION;

EID: 79960560482     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.06.012     Document Type: Article
Times cited : (16)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.