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Volumn 328, Issue 1, 2011, Pages 25-29
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Development of phase-pure CuAlO2 thin films grown on c-plane sapphire substrates prepared by RF sputtering
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Author keywords
A1. Annealing; A3. RF Sputtering; B1. Oxides; B2. Transparent conducting oxides
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Indexed keywords
A1. ANNEALING;
ANNEALING PROCESS;
AS-DEPOSITED FILMS;
B1. OXIDES;
B2. TRANSPARENT CONDUCTING OXIDES;
C-PLANE SAPPHIRE;
C-PLANE SAPPHIRE SUBSTRATES;
CERAMIC TARGET;
DEPOSITION TEMPERATURES;
ORDERS OF MAGNITUDE;
P-TYPE CONDUCTIVITY;
POST ANNEALING;
RADIO FREQUENCIES;
RF-SPUTTERING;
ROOM TEMPERATURE;
SAPPHIRE SUBSTRATES;
VISIBLE REGION;
ALUMINUM;
AMORPHOUS FILMS;
ANNEALING;
DEPOSITION;
ELECTRIC CONDUCTIVITY;
LEAD OXIDE;
SAPPHIRE;
SUBSTRATES;
THIN FILMS;
VAPOR DEPOSITION;
COPPER;
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EID: 79960560482
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2011.06.012 Document Type: Article |
Times cited : (16)
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References (21)
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