Characterization of CuAlO2 thin film prepared by rapid thermal annealing of an Al2O3/Cu2O/sapphire structure

Journal of Physics and Chemistry of Solids

Volumn 66, Issue 11, 2005, Pages 2123-2126

  Shy, J H ^a   Tseng, B H ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

A. Oxides; A. Thin films; CuAlO2

Indexed keywords

CHARACTERIZATION; COPPER COMPOUNDS; CRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; X RAY DIFFRACTION ANALYSIS;

A. OXIDES; A. THIN FILMS; COOLING RATE; CUALO3;

THIN FILMS;

EID: 29144529793     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2005.09.062     Document Type: Conference Paper

References (7)

1. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono Nature 389 1997 939 942
2. H. Ohta, M. Orita, M. Hirano, and H. Hosono J. Appl. Phys. 89 2001 5720 5725
3. T. Dietl, H. Ohno, F. Matsukura, J. Cibert, and D. Ferrand Science 287 2000 1019
4. A. Lugue, A. Marti, N. López, E. Antolin, E. Cánovas et al. Appl. Phys. Lett. 87 (2005) 083505.
5. A.N. Banerjee, S. Kundoo, and K.K. Chattopadhyay Thin Solid Films 440 2003 5 10
6. R.E. Stauber, J.D. Perkins, P.A. Parilla, and D.S. Ginley Electrochem. Solid-State Lett. 2 1999 654 656
7. T. Ishiguro, A. Kitazawa, N. Mizutani, and M. Kato J. Solid State Chem. 40 1981 170 174