Composition and structure control of Cu-Al-O films prepared by reactive sputtering and annealing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 1, 2007, Pages 351-355

  Tsuboi, Nozomu ^a   Itoh, Yuji ^a,b   Ogata, Junya ^a,c   Kobayashi, Satoshi ^a   Shimizu, Hidehiko ^a   Kato, Keizo ^a   Kaneko, Futao ^a  

^a NIIGATA UNIVERSITY   (Japan)

^b FUJIFILM CORPORATION   (Japan)

^c ALPS ELECTRIC CO LTD   (Japan)

Author keywords

CuAlO2; Delafossite; Reactive sputtering; Transparent conducting oxide

Indexed keywords

ANNEALING; NITROGEN; REACTIVE SPUTTERING; SUBSTRATES;

DELAFOSSITE; TRANSPARENT CONDUCTING OXIDE;

METALLIC FILMS;

EID: 34547909976     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.351     Document Type: Article

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