RF reactive sputter deposition and characterization of transparent CuAlO2 thin films

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 3, Issue 8, 2006, Pages 2895-2898

  Lu, Y M ^a   He, Y B ^a   Yang, B ^a   Polity, A ^a   Volbers, N ^a   Neumann, C ^a   Hasselkamp, D ^a   Meyer, B K ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

QUARTZ GLASS; RF REACTIVE SPUTTER DEPOSITION; SAPPHIRE SUBSTRATES; TRANSPARENT CUALO2 THIN FILMS;

CHARACTERIZATION; COPPER COMPOUNDS; OPTIMIZATION; QUARTZ APPLICATIONS; SPUTTER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION;

THIN FILMS;

EID: 33750287489     PISSN: 18626351     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssc.200669571     Document Type: Conference Paper

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